Direct fabritcation of 3D graphene on nanoporous anodic alumina by plasma-enhanced chemical vapour deposition
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Date
2016-01-25
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Scientific Reports
Abstract
High surface area electrode materials are of interest for a wide range of potential applications such
as super-capacitors and electrochemical cells. This paper describes a fabrication method of threedimensional
(3D) graphene conformally coated on nanoporous insulating substrate with uniform
nanopore size. 3D graphene films were formed by controlled graphitization of diamond-like amorphous
carbon precursor films, deposited by plasma-enhanced chemical vapour deposition (PECVD).
Plasma-assisted graphitization was found to produce better quality graphene than a simple thermal
graphitization process. The resulting 3D graphene/amorphous carbon/alumina structure has a very
high surface area, good electrical conductivity and exhibits excellent chemically stability, providing
a good material platform for electrochemical applications. Consequently very large electrochemical
capacitance values, as high as 2.1 mF for a sample of 10 mm3, were achieved. The electrochemical
capacitance of the material exhibits a dependence on bias voltage, a phenomenon observed by other
groups when studying graphene quantum capacitance. The plasma-assisted graphitization, which
dominates the graphitization process, is analyzed and discussed in detail.
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Citation
Zhan, H., Garrett, D. J., Apollo, N. V., Ganesan, K., Lau, D., Prawer, S., & Cervenka, J. (2016). Direct fabrication of 3D graphene on nanoporous anodic alumina by plasma-enhanced chemical vapor deposition. Scientific Reports, 6, 19822. http://doi.org/10.1038/srep19822