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Title: Direct fabritcation of 3D graphene on nanoporous anodic alumina by plasma-enhanced chemical vapour deposition
Authors: Zhan, Hualin
Garrett, David
Apollo, Nicholas
Ganesan, Kumaravelu
Lau, Desmond
Prawer, Steven
Cervenka, Jiri
Issue Date: 25-Jan-2016
Publisher: Scientific Reports
Citation: Zhan, H., Garrett, D. J., Apollo, N. V., Ganesan, K., Lau, D., Prawer, S., & Cervenka, J. (2016). Direct fabrication of 3D graphene on nanoporous anodic alumina by plasma-enhanced chemical vapor deposition. Scientific Reports, 6, 19822. http://doi.org/10.1038/srep19822
Series/Report no.: 6;19822
Abstract: High surface area electrode materials are of interest for a wide range of potential applications such as super-capacitors and electrochemical cells. This paper describes a fabrication method of threedimensional (3D) graphene conformally coated on nanoporous insulating substrate with uniform nanopore size. 3D graphene films were formed by controlled graphitization of diamond-like amorphous carbon precursor films, deposited by plasma-enhanced chemical vapour deposition (PECVD). Plasma-assisted graphitization was found to produce better quality graphene than a simple thermal graphitization process. The resulting 3D graphene/amorphous carbon/alumina structure has a very high surface area, good electrical conductivity and exhibits excellent chemically stability, providing a good material platform for electrochemical applications. Consequently very large electrochemical capacitance values, as high as 2.1 mF for a sample of 10 mm3, were achieved. The electrochemical capacitance of the material exhibits a dependence on bias voltage, a phenomenon observed by other groups when studying graphene quantum capacitance. The plasma-assisted graphitization, which dominates the graphitization process, is analyzed and discussed in detail.
URI: http://repository.bionicsinstitute.org:8080/handle/123456789/175
ISSN: 2045-2322
Appears in Collections:Other research publications

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